Wafer Cleaning System
Wafer cleaning system NAMIKI-ECCLEAR - the world's first cleaning tool enabling high quality cleaning and drying for wafers less than 2 inches in diameter.
Until now, cleaning for new materials, such as small crystals or wafers less than 2 inches in diameter, has been limited to processes such as dip cleaning, resulting in unsatifactory cleanliness. Because of this, it has been a challenge to make devices that are able to utilize these new, advanced materials to their full potential.
NAMIKI-ECCLEAR has been built on Namiki's own cleaning know-how, developed through the manufacturing of sapphire wafers for LED applications, and features a newly-developed, original cleaning/drying mechanism for small-sized wafers. With these new functions, NAMIKI-ECCLEAR has a capability of high level cleaning and solves the previous issues of cleaning, which had become an obstacle in the development of these new, advanced materials.
Through NAMIKI-ECCLEAR, Namiki strongly supports the development of new advanced materials and manufacturing of related devices.
Original Scrubber Cleaning System
High-efficiency particle removal is achieved without causing surface or subsurface damages.
High quality of drying for small wafers is achieved with decentering spin dryer.
Patent No. WO2015-098699
Able to customize according to specific needs.
- Single crystal (GaN, SiC, AlN, Sapphire, Diamond)
- Optical glass
- Wafer transportation
- Vacuum chuck
- Rinse (with pure water)
- Scrubber cleaning
(with cleaning solution)
- Megasonic cleaning
- Spin dryer
- Wafer transportation
Example of cleaning results
＜□5mm Sapphire substrate＞
＜□5mm GaN Substrate＞
Particles were removed after cleaning without formation of latent flaws.
Adamant Namiki is also providing contract wafer cleaning service.
|Cleaning process||Single wafer|
|Wafer size||□3～5mm, φ0.5", φ1"
（Others also available）
|Cleaning time using
(loading to unloading)
|Scrubber cleaning (brush height adjustable)|
|Mega sonic cleaning @950kHz|
|Decentering spin dryer (rotational speed：～3,000rpm)|
|HEPA filter (FFU)|
|480W x 600D x 1,680H|
|Utilities||Air pump (external): 0.5MPa or higher|
|DI water (recommended process): 400ml/wafer|
|Power supply: 100VAC single-phase 1,000W|
*If you cannot find the contact form, please click here.